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Laboratorytalk
- April 2007
Edited by the Laboratorytalk editorial team
Vibration isolators aid nano-research
David K Ferry heads up the Nanostructures Research
Group at Arizona State University (ASU) in Tempe, a collection
of faculty, staff and students working on research in the
regimes of nanolithography, and the physics of nanostructures
and ultrasmall semiconductor devices. The group is a part
of the University's College of Engineering, centre for Solid
State Electronics Research, whose alumni makes up a serious
constituency throughout the nanoelectronics universe, in both
industry and academia.
Their current interests lie in the area of quantum dots,
quantum wires, and ultra-small semiconductor devices in a
variety of materials. The group conducts a wide spectrum of
theoretical studies of quantum transport in these very small
devices.
For example, they are doing a process called scanning gate
microscopy at low temperatures.
This involves taking the equivalent of an atomic force microscope
and putting bias on it, and studying the change in conductance
of small semiconductor structures as they move this bias tip
around on a surface.
Their system is mounted in a large cryogenic cooler, an enclosed
container with a helium-3 cooling system, an isotope of a
helium molecule - which is brought down to 300mK, or 1000x
below room temperature, about one-half a degree above absolute
zero.
Dr Ferry's group is using a process called a piezoelectric
sensor. They metalicise the AFM cantilevered tip with a very
thin layer of metal so they can apply a voltage to it. Then
use that voltage to perturb the structure they are looking
at.
As the tip moves it creates a voltage across the plane, which
is measured to determine certain mechanical property values.
This is a technique that was developed at Harvard four to
five years ago.
This type of experimentation is not uncommon, similar experiments
are being done by a large number of universities. But what
is not common is the system that the Nanostructures Research
Group is using for vibration isolation: negative-stiffness
vibration isolation, developed by Minus K Technology - which
provides a significantly greater and more stable attenuation
of the critical lower vibration frequencies, and therefore
more reliable accrued datasets.
When measuring a very few angstroms or nanometres of displacement,
you have got to have an absolutely stable surface on which
to rest your instrument. If you do not, any of that vibration
coupled into the mechanical structure of your instrument will
cause vertical noise, and fundamentally an inability to measure
these kinds of high resolution features.
Any kind of vibration noise in the system makes that AFM
cantilever tip move, and that gives you bad signals and incorrect
data, says Dr Ferry.
We actually went further than most university applications
because we integrated a rather large magnet into our system,
something that Harvard, for example, is just now putting into
their operation.
The magnet allows us to look at different types of transport.
We can turn the magnet on and look at the magneto-transport
of the semiconductors. It is a quite a different mode of transport
altogether.
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Nanoelectronics pioneer uses negative-stiffness vibration
isolation technology to eliminate ultralow environmental
frequencies and improve dataset integrity in nanoelectronics
AFM research.
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The entire system had to be isolated, not just the
cantilever, continues Dr Ferry. We required an extremely
high level of vibration isolation given our research
parameters. We are deriving modern electronic devices
from our experiments. Future electronic devices are
our interest.
What we are doing is looking at the conductivity
of materials and then seeing how quantum mechanics
fits into this. We study basic physics which has a
real application - engineering - and particularly
in the semiconductor industry.
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Our research covers: (first) electron beam lithography of
quantum dots and quantum devices, with applications such as
quantum ballistic transport at very low temperatures and high
magnetic fields, as well as the quantum-classical transition,
and the role of quantum effects in real devices at room temperature.
(Secondly) magneto-transport studies used to probe the nature
of electron dynamics in semiconductor quantum dots, which
are quasi-zero-dimensional structures whose size is comparable
to the Fermi wavelength of the electrons themselves.
Magneto-transport studies may be used to probe these phenomena
and to determine the factors which limit electron phase coherence
within the structures.
Current interest in these devices is motivated by their potential
application in new areas of technology, such as quantum computing
and ultra high frequency signal processing.(Thirdly) surface
chemical analysis performed with a scanning Auger microprobe.
Under good conditions, a lateral resolution of about 2 nm
is achievable. And, (fourthly) Professor Michael Kozicki,
in the group, has examined chemically enhanced vapour etching
(CEVE) patterning technique.
He has used hydrocarbon contamination layers from laboratory
air or vacuum chamber ambients and successfully demonstrated
nanoscale pattern formation in silicon dioxide. He has also
developed a nitrogen chamber coupled directly to a UHV STM/AFM
facility for CEVE processing of silicon dioxide resists, and
their use in semiconductor device fabrication.
Within the nitrogen chamber there is a processing system for
the actual CEVE development. But, the current work with the
scanning probe system is really interesting, and made possible
by the negative-stiffness isolators, says Dr Ferry.
The negative-stiffness isolator is a passive isolation approach,
and has a key advantage in that it is not powered. It has
no electricity going to it. So, in a site where heat buildup
could be an issue, such as with enclosed cryogenic chambers,
negative-stiffness becomes a highly efficient option.
Negative-stiffness isolators employ a unique - and completely
mechanical - concept in low-frequency vibration isolation.
Vertical-motion isolation is provided by a stiff spring that
supports a weight load, combined with a negative-stiffness
mechanism (NSM).The net vertical stiffness is made very low
without affecting the static load-supporting capability of
the spring.
Beam-columns connected in series with the vertical-motion
isolator provide horizontal-motion isolation. The horizontal
stiffness of the beam-columns is reduced by the beam-column'
effect.(A beam-column behaves as a spring combined with an
NSM.) The result is a compact passive isolator capable of
very low vertical and horizontal natural frequencies and very
high internal structural frequencies.
The isolators (adjusted to 0.5Hz) achieve 93% isolation efficiency
at 2Hz, 99% at 5Hz, and 99.7% at 10Hz. Negative-stiffness
isolators provide a capability quite unique to the field of
nanotechnology - specifically, the transmissibility of the
negative-stiffness isolator. That is, the vibration that transmits
through the isolator as measured as a function of floor vibrations
- which is substantially improved over active isolation systems.
Although active isolation systems have fundamentally no resonance,
their transmissibility does not roll off as fast as negative-stiffness
isolators. So, at building and seismic frequencies the transmissibility
of active isolators can be 10x greater than negative-stiffness
isolators.
This causes substantial adverse measurement and imaging artifacts
in the data. Compared with other laboratory research instrumentation,
the growth of AFM usage has been quite extensive over the
past 10 years.
AFM equipment placement has gone through a doubling phase
pretty much every year during the last decade. Since its inception
in 1988, it has continuously proven to be a key tool in moving
nanotechnology research forward.
More than half of the universities in the United States, and
worldwide, are engaging in nanotechnology research, says Dr
Ferry.In the electronic area, the nanoelectronic side of it
has been going since the late 1960s.This is driven by the
fact that in the semiconductor industry all things are getting
smaller and smaller. Today, the transistors have critical
dimensions down around 25nm.
And the most critical dimension is the oxide thickness which
is 1nm.When you consider that you have to control 1nm vertical
thickness over 300mm of lateral dimension, that is a difference
of 10 to the 8th power. That defines what modern manufacturing
technology produces.
The need for effective vibration isolation has never been
greater, and will continue to become more demanding as the
nano-industry progresses.
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