
Industrial
Equipment News - May 2007
Improving AFM Data Reliability in Nanoelectronics
Research, Utilizing Negative-Stiffness Vibration Isolation
By Jim McMahon
It was long after
1977 that the name nanoelectronics actually came into use,
but Dr. David K. Ferry was already actively engaged in developing
some of the world's smallest transistors in the latter 1970s.
The field, called Ultra-Small Devices at that time, was in
its infancy, and Dr. Ferry's research team was one of only
four select groups around the world aggressively researching
the limits of small electronic devices.
Today, Dr.
Ferry heads up the Nanostructures Research Group at Arizona
State University (ASU) in Tempe, a collection of faculty,
staff, and students working on research in nanolithography,
and the physics of nanostructures and ultrasmall semiconductor
devices. The group is part of the University's College of
Engineering, Center for Solid State Electronics Research,
whose alumni are a serious constituency throughout the nanoelectronics
universe, in both industry and academia.
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Their
current interests lie in the area of quantum dots,
quantum wires, and ultrasmall semiconductor devices
in a variety of materials, and the group conducts
a wide spectrum of theoretical studies of quantum
transport in these very small devices. For example,
they are doing a process called scanning gate microscopy
at low temperatures, which involves taking the equivalent
of an atomic force microscope (AFM) and putting bias
on it, and studying the change in conductance of small
semiconductor structures as they move this bias tip
around on a surface.
(Shown, AFM image of a quantum point contact)
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Their system is
mounted in a large cryogenic cooler, an enclosed container
with a helium-3 cooling system, an isotope of a helium molecule
that is brought down to 300 milli-Kelvin, or 1,000 times below
room temperature, about one-half a degree above absolute zero.
The cooler has a vacuum jacket around it to prevent heat from
transmitting in, and to protect the cold from being mitigated
by the ambient room temperature.
| The
AFM tip is on a cantilever. Normally, you just move
this cantilever along the surface, then note the change
in position as it goes over the topography. Dr. Ferry's
group, however, is utilizing a process called a piezoelectric
sensor, adding a very thin layer of metal to the AFM
cantilevered tip so they can apply a voltage to it,
then use that voltage to perturb the structure they
are looking at. As the tip moves, it creates voltage
across the plane, which is measured to determine certain
mechanical property values. The technique was developed
at Harvard 4-5 years ago. |
Illustrated, AFM image of a quantum point contact
showing isolation trenches
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What
Is Negative-Stiffness Vibration Isolation?
This type of experimentation
is not uncommon, with similar experiments underway at a large
number of universities. But what is different is the vibration
isolation system being used by the Nanostructures Research
Group: negative-stiffness vibration isolation, developed by
Minus K Technology, which provides
a significantly greater and more stable attenuation of the
critical lower vibration frequencies, and therefore more reliable
accrued data sets.
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When
measuring a very few angstroms or nanometers of displacement,
you have got to have an absolutely stable surface
upon which to rest your instrument. If you do not,
any of that vibration coupled into the mechanical
structure of your instrument will cause vertical noise,
and a fundamental inability to measure these kinds
of high resolution features. (Shown, Minus K negative
stiffness vibration isolation platform.)
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"Any
kind of vibration noise in the system makes the AFM cantilever
tip move, and that gives you bad signals and incorrect data,"
says Dr. Ferry. "We actually went further than most university
applications because we integrated a rather large magnet into
our system, something that Harvard, for example, is just now
putting into their operation. The magnet allows us to look
at different types of transport. We can turn the magnet on
and look at the magneto-transport of the semiconductors. It
is quite a different mode of transport altogether.
"The
entire system had to be isolated, not just the cantilever,"
continues Dr. Ferry. "We required an extremely high
level of vibration isolation, given our research parameters.
We are deriving modern electronic devices from our experiments.
Future electronic devices are our interest. What we are
doing is looking at the conductivity of materials and then
seeing how quantum mechanics fits into this. We study basic
physics which has a real application for engineering and
particularly in the semiconductor industry. Our research
covers:
"(1) Electron beam lithography of quantum
dots and quantum devices, with applications such as quantum
ballistic transport at very low temperatures and high
magnetic fields, as well as the quantum-classical transition,
and the role of quantum effects in real devices at room
temperature.
" (2)
Magneto-transport studies used to probe the nature of
electron dynamics in semiconductor quantum dots, which are
quasi-zero-dimensional structures whose size is comparable
to the Fermi wavelength of the electrons themselves. Magneto-transport
studies may be used to probe these phenomena and to determine
the factors which limit electron phase coherence within the
structures. Current interest in these devices is motivated
by their potential application in new areas of technology,
such as quantum computing and ultra high frequency signal
processing.
"(3) Surface chemical analysis performed with
a scanning Auger microprobe. Under good conditions, a lateral
resolution of about 25 nm is achievable.
"(4) Professor Michael Kozicki, in the group, has examined
Chemically Enhanced Vapor Etching (CEVE) patterning
technique. He has used hydrocarbon contamination layers
from laboratory air or vacuum chamber ambients and successfully
demonstrated nanoscale pattern formation in silicon dioxide.
He has also
developed a nitrogen chamber coupled directly to a UHV STM/AFM
facility for CEVE processing of silicon dioxide resists,
and their use in semiconductor device fabrication. Within
the nitrogen chamber there is a processing system for the
actual CEVE development.
"But,
the current work with the scanning probe system is really
interesting, and made possible by the negative-stiffness isolators,"
Dr. Ferry concludes.
Key Advantages
The negative-stiffness isolator, a passive isolation approach,
has a key advantage in that it is not powered -- it has no
electricity going to it. So, in a site where heat buildup
could be an issue, such as with enclosed cryogenic chambers,
negative-stiffness becomes a highly efficient option.
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Negative-stiffness
isolators employ a unique -- and completely mechanical
-- concept in low-frequency vibration isolation. Vertical-motion
isolation is provided by a stiff spring that supports
a weight load, combined with a negative-stiffness
mechanism (NSM). The net vertical stiffness is made
very low without affecting the static load-supporting
capability of the spring. Beam-columns connected in
series with the vertical-motion isolator provide horizontal-motion
isolation. The horizontal stiffness of the beam-columns
is reduced by the "beam-column" effect.
(A beam-column behaves as a spring combined with an
NSM.) The result is a compact passive isolator capable
of very low vertical and horizontal natural frequencies
and very high internal structural frequencies. The
isolators (adjusted to 1/2 Hz) achieve 93% isolation
efficiency at 2 Hz, 99% at 5 Hz, and 99.7% at 10 Hz.
(Shown here, ASU's Dewar sitting on negative stiffness
vibration isolation platform.)
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Negative-stiffness
isolators provide a capability quite unique to the field
of nanotechnology -- specifically, the transmissibility
of the negative-stiffness isolator, that is, the vibration
that transmits through the isolator as measured as a function
of floor vibrations -- which is substantially improved over
active isolation systems. Although active isolation systems
fundamentally have no resonance, their transmissibility
does not roll off as fast as negative-stiffness isolators.
So, at building and seismic frequencies the transmissibility
of active isolators can be 10X greater than negative-stiffness
isolators. This causes substantial adverse measurement and
imaging artifacts in the data.
Compared to
other laboratory research instrumentation, the growth of AFM
usage has been quite extensive over the past 10 years. AFM
equipment placement has gone through a doubling phase pretty
much every year during the last decade. Since its inception
in 1988, it has continuously proven to be a key tool in moving
nanotechnology research forward.
"More
than half of the universities in the United States, and worldwide,
are engaging in nanotechnology research," says Dr. Ferry.
"In the electronic area, the nanoelectronic side of it
has been going since the late 1960s. This is driven by the
fact that in the semiconductor industry all things are getting
smaller and smaller.
Today, the
transistors have critical dimensions down around 25 nanometers.
And the most critical dimension is the oxide thickness, which
is 1 nanometer. When you consider that you have to control
one nanometer vertical thickness over 300 millimeters of lateral
dimension, that is a difference of 10 to the 8th power. That
defines what modern manufacturing technology produces. The
need for effective vibration isolation has never been greater,
and will continue to become more demanding as the nano-industry
progresses."
David K. Ferry, Ph.D.,
M.S.E.E., B.S.E.E., is a Regents' Professor of Electrical
Engineering; recipient of the Arizona State University Graduate
Mentor Award, 2001; and recipient of the IEEE Cledo Brunetti
Award, 1999 for fundamental contributions to the theory and
development of nanostructured devices. Dr. Ferry has authored
and co-authored several books, including Electronic Materials
and Devices (2001) and Semiconductor Transport (2001).
Dr. David L. Platus is the inventor of negative-stiffness
mechanism vibration isolation systems, and President and Founder
of Minus K Technology, Inc. He earned a B.S. and a Ph.D. in
Engineering from UCLA, and a diploma from the Oak Ridge School
of (Nuclear) Reactor Technology. Dr. Platus holds over 20
patents related to shock and vibration isolation.
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